| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position measuring method of measuring the position information of a mark with high precision. <P>SOLUTION: A plurality of noise information are obtained by imaging a plurality of areas in regions RR1, RR2 in each of which a mark or the like on a reticle R is not formed, and in regions WR1, WR2 in each of which mark on a reference board WFB is not formed. Subsequently, there is presumed noise information which is desirable to obtain the position information of the mark from the plurality of obtained noise information. Signal processing is carried out based on the presumed noise information and an image pick-up signal obtained by imaging a reticle mark formed on the reticle R and a wafer reference mark formed on the reference board WFB, and consequently the position information of these marks is obtained. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
