| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of improving the quality of an image created by controlling an exposure by a radiation beam having spectra. <P>SOLUTION: The exposure is controlled at least partially on the basis of a relative contrast loss to the spectra of a radiation source and a projected pattern or at least partially on the basis of the average absolute detuning of the radiation source. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
