| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment method, a method of measuring an alignment errors from front side to rear side, a method of detecting a non-orthogonality, a correcting method, and a lithography device. <P>SOLUTION: In a method of measuring a front and rear side alignment errors by one embodiment, a transparent substrate has a plurality of marks on both sides of the front and rear sides. A relative position of the marks on the front and rear sides of the substrate is obtained, and the alignment errors of the front and rear sides of the whole body of the substrate are measured. In a further embodiment, the substrate is rotated by 180° on the basis the surface of the substrate, and the relative position of the front side of the mark is obtained. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
