| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoelectric measuring apparatus in which impact of deterioration in sensitivity and sensitivity drift of a photoelectric conversion element can be compensated for easily and precisely, down time of the apparatus due to sensitivity compensation can be shortened, the photoelectric conversion element can be used efficiently and replaced by judging the quality thereof, and such a risk as sensibility of the photoelectric conversion element is lost suddenly during use and the apparatus becomes impossible to use can be avoided, and to provide an exposure device employing that photoelectric measuring apparatus. <P>SOLUTION: Impact of deterioration in sensitivity and sensitivity drift of a semiconductor photoelectric conversion element 2 is compensated for easily and precisely by monitoring correlation between outputs from the quantity of light measuring part 31 and the measuring part 32 for sensitivity calibration on the same light receiving surface of the photoelectric conversion element 2, and down time of the apparatus due to sensitivity compensation is shortened. The photoelectric conversion element 2 can be used efficiently and replaced by judging the quality thereof, and such a risk as sensibility of the photoelectric conversion element 2 is lost suddenly during use and the apparatus becomes impossible to use can be avoided. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
