| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate processing equipment in which a substrate processing chamber can be drawn out easily from a housing. SOLUTION: On the side face 211s of an intermediate block 211 and the side face 20s of a substrate processing chamber 20a, a slide assist mechanism 30a for drawing out the substrate processing chamber 20a from a housing 11 (shelf board 112a) in the direction of a traveling route 2 by doubling an applied force is provided. The slide assist mechanism 30a comprises a motion transmitting mechanism 31 for moving the intermediate blocks 211 and 212 linearly in the drawing direction for the shelf board 112a, and a motion transmitting mechanism 32 for moving the substrate processing chamber 20a linearly in the drawing direction for the intermediate blocks 211 and 212 in response to linear motion of the intermediate blocks 211 and 212 in the drawing direction for the shelf board 112a. COPYRIGHT: (C)2006,JPO&NCIPI
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