| 发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition and a photosensitive lithographic printing plate having high sensitivity and excellent storage stability. <P>SOLUTION: The photosensitive composition contains a polymer having a vinylphenyl group in a side chain, a compound having a urethane bond and a polymerizable double bond, a monomer or oligomer having no urethane bond and two or more polymerizable double bonds per molecule, and a photopolymerization initiator. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006039179(A) |
申请公布日期 |
2006.02.09 |
| 申请号 |
JP20040218420 |
申请日期 |
2004.07.27 |
| 申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
SEIYAMA HIDEO;FURUKAWA AKIRA |
| 分类号 |
G03F7/038;G03F7/00;G03F7/004;G03F7/027 |
主分类号 |
G03F7/038 |
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