| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing system, and more specifically, to provide a lithography bay for small lot size. <P>SOLUTION: A lithography bay 300 for small lot size includes (1) a plurality of lithography tools 314 to 328, and (2) a conveying system 330 for small lot size which is adapted to convey substrate carriers for small-lot size to the lithography tools 314 to 328. Each of the substrate carriers is adapted to hold less than 13 substrates. Many other embodiments are also provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
