发明名称 |
Megasonic immersion lithography exposure apparatus and method |
摘要 |
A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer. An optical transfer chamber is provided adjacent to the optical system for containing an exposure liquid. At least one megasonic plate operably engages the optical transfer chamber for inducing sonic waves in and eliminating microbubbles from the exposure liquid.
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申请公布号 |
US2006028626(A1) |
申请公布日期 |
2006.02.09 |
申请号 |
US20040910480 |
申请日期 |
2004.08.03 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHANG CHING-YU;LIN CHIEN-HUNG;LIN CHIN-HSIANG;LU DAVID;TSENG HORNG-HUEI;LIN BURN-JENG |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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