Lithography system for processing at least a part of a target

摘要

The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.

主权项

1. Lithography system for processing at least a part of a target, the target comprising a target surface with a position mark, the lithography system comprising
a beam source arranged for providing a patterning beam; a final projection system arranged for projecting said patterning beam on at least a part of the target surface; a mark position detection system arranged for detecting a position of the position mark on the target surface, the mark position detection system comprising a light source arranged for providing a light beam, an optical element arranged for projecting said light beam on the target surface and a light detector arranged for detecting a reflected light beam, wherein the reflected light beam is generated by reflection of the light beam on the target surface, wherein the mark position detection system is configured for detecting a position of the target surface with respect to the optical element;
further comprising a support system, comprising a final projection system support arranged for supporting the final projection system, wherein the support system further comprises a frame arranged for supporting the final projection system support,wherein the light detector of said mark position detection system is positioned in the frame.