Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern

摘要

A polymerization method of a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), which has excellent lithography properties, and is useful as a resist composition, the method including conducting polymerization using a mixed solvent containing 10 mass % or more of one or more of a cyclic ketone-based solvent, an ester-based solvent, and a lactone-based solvent. A resist composition containing the high-molecular weight compound (A1) and a method for forming a resist pattern using the same.;

主权项

1. A polymerization method of a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), the method comprising conducting polymerization using a mixed solvent containing 10 mass % or more of one or more kinds of solvents selected from the group consisting of a cyclic ketone-based solvent, an ester-based solvent, and a lactone-based solvent: wherein Ra1 represents a monovalent substituent having a polymerizable group; La1 represents an oxygen atom, a sulfur atom, or a methylene group; R1 represents a lactone-containing cyclic group, an —SO2—-containing cyclic group or a carbonate-containing cyclic group; and n is an integer of 0 to 5.