发明名称 REMOVAL OF METAL CONTAMINANTS FROM ULTRA-HIGH PURITY GASES
摘要 <p>The invention is a method and apparatus for removing metal compounds from ultra-high purity gases using a purifier material comprising a high surface area inorganic oxide, so that the metals do not deposit on a sensitive device and cause device failure.</p>
申请公布号 WO2006014655(A1) 申请公布日期 2006.02.09
申请号 WO2005US25608 申请日期 2005.07.19
申请人 MYKROLIS CORPORATION;ALVAREZ, DANIEL, JR.;SCOGGINS, TROY, B.;NGUYEN, TRAM, DOAN;OHYASHIKI, YASUSHI 发明人 ALVAREZ, DANIEL, JR.;SCOGGINS, TROY, B.;NGUYEN, TRAM, DOAN;OHYASHIKI, YASUSHI
分类号 (IPC1-7):B01D53/02;C01B6/34;C01B25/06;C01B33/04;C01B35/02;C01B3/56 主分类号 (IPC1-7):B01D53/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利