发明名称 SOLID-STATE IMAGING ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To restrain incidence of light on regions other than the light receiving region from the light shielding film end which will result in smear of a solid-state imaging element. SOLUTION: The solid-state imaging element comprises a light receiving region 2 formed of a diffused layer formed on a semiconductor substrate 1, a reflection preventing film 7 formed on the light receiving region 2, and a light shielding film 6 formed on the semiconductor substrate 1 so that a region of the reflection preventing film 7 becomes an aperture. The reflection preventing film 7 has the surface projected upward. Therefore, even when the light enters with inclination from the aperture of the light shielding film 6, the light can be concentrated to the center of the light receiving region 2 through refraction at the curved surface. Accordingly, the incident light does not reach a charge transfer region 3 formed adjacent to the light receiving region 2 and thereby smear can be reduced. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041026(A) 申请公布日期 2006.02.09
申请号 JP20040215868 申请日期 2004.07.23
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SHIBATA SHINJI
分类号 H01L27/14;G02B5/00 主分类号 H01L27/14
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