| 发明名称 |
PHOTOCURABLE LIQUID RESIN COMPOSITION |
| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photocurable liquid resin composition for providing a cured product having excellent impact resistance. SOLUTION: The photocurable liquid resin composition comprises (A) a compound containing one polymerizable carbon-carbon double bond in the molecule represented by formula (2) (R<SP>4</SP>is an organic group containing a polymerizable carbon-carbon double bond; R<SP>5</SP>is a 1-10C alkyl group; R<SP>6</SP>and R<SP>7</SP>are each a 1-10C alkyl group or a 6-20C monofunctional alicyclic group), (B) a cationic polymerizable compound and (C) a cationic photopolymerization initiator. COPYRIGHT: (C)2006,JPO&NCIPI
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| 申请公布号 |
JP2006036825(A) |
申请公布日期 |
2006.02.09 |
| 申请号 |
JP20040215098 |
申请日期 |
2004.07.23 |
| 申请人 |
JSR CORP;JAPAN FINE COATINGS CO LTD |
发明人 |
TATARA AKITSUGU;TAKASE KATSUYUKI;YASHIRO TAKAO;TANABE TAKAYOSHI |
| 分类号 |
C08G85/00;C08F216/12 |
主分类号 |
C08G85/00 |
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