发明名称 Flash memory devices including a pass transistor and methods of forming the same
摘要 Flash memory integrated circuit devices include an integrated circuit substrate. A cell array on the integrated circuit substrate includes a plurality of cell transistors. A bit line is coupled to ones of the plurality of cell transistors and a first pass transistor is coupled to the bit line. The first pass transistor has a first diffusion structure configured to provide a breakdown voltage higher than that of a second diffusion structure. One or more second pass transistor(s) are coupled to the first pass transistor. The second pass transistor(s) have the second diffusion structure. The second diffusion structure may have a resistance smaller than a resistance of the first diffusion structure.
申请公布号 US2006030102(A1) 申请公布日期 2006.02.09
申请号 US20040021232 申请日期 2004.12.23
申请人 LEE CHANG-HYUN;SIM SANG-PIL;LEE SEUNG-KEUN 发明人 LEE CHANG-HYUN;SIM SANG-PIL;LEE SEUNG-KEUN
分类号 H01L21/336;H01L29/76 主分类号 H01L21/336
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