发明名称 METHOD FOR PRODUCING POROUS SILICA-BASED THIN FILM, POROUS SILICA-BASED THIN FILM, AND STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a porous silica-based thin film, by which the refractive index of the silica-based thin film to be formed can be controlled. SOLUTION: The method for producing the porous silica-based thin film having a controlled refractive index includes a process for forming the porous silica-based thin film by heat treating a thin film formed from a coating liquid containing an organic substance together with an alkoxysilane and/or an alkylalkoxysilane, under conditions that the organic substance evaporates or decomposes. The refractive index of the porous silica-based thin film is controlled by controlling the porosity of the porous silica-based thin film to be formed in the process. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006036598(A) 申请公布日期 2006.02.09
申请号 JP20040220248 申请日期 2004.07.28
申请人 UBE NITTO KASEI CO LTD 发明人 BANBA AKINORI
分类号 C01B33/12;C09D1/00;C09D183/00 主分类号 C01B33/12
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