发明名称 Device of microstructure imprint for pattern transfer and method of the same
摘要 The microstructure imprint device of the invention comprises: a supporting plate, a substrate, a moldable layer, a mold, and a microwave source, wherein the microwave discharged from the microwave source is being provided to the substrate, the moldable layer and the mold for heating up the moldable laye so as to soften the moldable layer, and the substrate having a layer of moldable layer arranged thereon is being placed on the supporting plate, and the mold is disposed at a position corresponding to the substrate and the supporting plate such that the mold can be pressed on the moldable layer for pattern transferring. The device the present invention is capable of enhancing the thermal state of a moldable layer in a short time by means of electromagnetic wave, such that the moldable layer can be heated in a short time and further the moldable layer can be softened.
申请公布号 US2006027949(A1) 申请公布日期 2006.02.09
申请号 US20040938528 申请日期 2004.09.13
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 WANG WEI-HAN;LIN CHIA-HUNG;HO YU-LUN;WU JEN-HUA
分类号 B29C51/08;B81C1/00;B81C99/00;G03F7/00 主分类号 B29C51/08
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