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发明名称
Procédé pour réaliser des couches épitaxiales régulières notamment pour la fabrication de composants à semi-conducteurs
摘要
申请公布号
FR1467423(A)
申请公布日期
1967.01.27
申请号
FR19660048451
申请日期
1966.02.04
申请人
SIEMENS & HALSKE AKTIENGESELLSCHAFT
发明人
分类号
C30B25/02;H01L21/205
主分类号
C30B25/02
代理机构
代理人
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地址
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