LITHOGRAPHIC DEVICE AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithographic device provided with a projection column having a gas-regulated environment that is hardly affected by the fluctuation of an ambient atmosphere.

SOLUTION: The lithographic device is disclosed. The lithographic device includes a projection system configured to project a patternized radiation beam on the target portion of a substrate. The projection system includes a housing and a plurality of optical elements disposed in the housing. In addition, the lithographic device includes an inlet for supplying a regulated gas to the housing and a gas discharge section for discharging the regulated gas from the housing to create the gas-regulated environment. At least one gate for making the gas-regulated environment communicate with the ambient atmosphere is disposed. The gate is disposed to perform the predetermined leakage of the regulated gas to the ambient atmosphere.

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