发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
申请公布号 US2016209761(A1) 申请公布日期 2016.07.21
申请号 US201615080258 申请日期 2016.03.24
申请人 ASML NETHERLANDS B.V. 发明人 SENGERS Timotheus Franciscus;VAN DE KERKHOF Marcus Adrianus;KROON Mark;VAN WEERT Kees
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址 Veldhoven NL