发明名称 RESIN COMPOSITION AND RESIN SOLUTION
摘要 <P>PROBLEM TO BE SOLVED: To provide a resin composition excellent in heat resistance and dynamic characteristics, and having a high transparency, also, a resin solution suitable for producing a phase differential film in an industrial scale and excellent in a long time preservation stability, and a high quality negative phase differential film. <P>SOLUTION: This resin composition consists of (a) 30-95 wt. % N-phenyl-substituted maleimide-olefin copolymer consisting 55-65 mol % specific N-phenyl-substituted maleimide residue unit and 45-35 mol % specific olefin residue unit, and (b) 70-5 wt. % styrene composition consisting of at least &ge;1 kind residual unit selected from a group consisting of a styrene-based monomer residual unit, a vinyl cyanide-based compound residual unit, an acrylic acid alkyl ester residual unit and a methacrylic acid alkyl ester residual unit, and having 95-60 mol % styrene-based monomer residual unit. Further, the negative phase differential film consisting of the same is provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006036967(A) 申请公布日期 2006.02.09
申请号 JP20040220363 申请日期 2004.07.28
申请人 TOSOH CORP 发明人 OKADA TAKASHI;TOYOMASU NOBUYUKI
分类号 C08L35/00;C08F210/00;C08F222/40;C08J5/18;C08K5/02;C08L25/00;G02B5/30;G02F1/13363 主分类号 C08L35/00
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