| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high frequency plasma treatment device with a simple structure, in which a uniform plasma treatment is carried out even for a large-sized treated material. <P>SOLUTION: The high frequency plasma treatment device is provided with a reaction container 5 in order to form a gas atmosphere for forming the plasma, an electric discharge electrode 2 arranged inside the reaction container 5, and an electromagnetic field control means in order to control a high frequency electric field distribution inside the reaction container 5. The electromagnetic field control means includes closed space rooms 6 arranged outside the reaction container 5, electromagnetically communicated with the reaction container 5, and formed so that leakage of the high frequency to the outside is prevented. The high frequency plasma treatment device formed so that the high frequency electric field distribution is varied by moving movable electromagnetic shield materials 26 inside the closed space rooms 6. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
