发明名称 |
Method for removing carbon-containing residues from a substrate |
摘要 |
A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.
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申请公布号 |
US2006027249(A1) |
申请公布日期 |
2006.02.09 |
申请号 |
US20050178545 |
申请日期 |
2005.07.12 |
申请人 |
JOHNSON ANDREW D;SUBAWALLA HOSHANG;JI BING;VRTIS RAYMOND N;KARWACKI EUGENE J JR;RIDGEWAY ROBERT G;MAROULIS PETER J;O'NEILL MARK L;LUKAS AARON S;MOTIKA STEPHEN A |
发明人 |
JOHNSON ANDREW D.;SUBAWALLA HOSHANG;JI BING;VRTIS RAYMOND N.;KARWACKI EUGENE J.JR.;RIDGEWAY ROBERT G.;MAROULIS PETER J.;O'NEILL MARK L.;LUKAS AARON S.;MOTIKA STEPHEN A. |
分类号 |
C25F5/00 |
主分类号 |
C25F5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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