发明名称 Radiation source, metrology apparatus, lithographic system and device manufacturing method
摘要 A radiation source apparatus comprising: a container comprising walls for defining a space for containing a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation; and a thermal load applicator adapted to apply a thermal load to at least part of the walls of the container to reduce stresses in the walls.
申请公布号 IL245886(D0) 申请公布日期 2016.07.31
申请号 IL20160245886 申请日期 2016.05.26
申请人 ASML NETHERLANDS B.V. 发明人
分类号 H01J 主分类号 H01J
代理机构 代理人
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