发明名称 ELECTROLESS COPPER PLATING SOLUTION, AND ELECTROLESS COPPER PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electroless copper plating solution which can be processed simply at the time of disposal, and can sufficiently reduce the burden on the biological environment or the like. SOLUTION: In the electroless copper plating solution containing a reducing agent for reducing copper ions and depositing copper on a surface of an object to be plated which is immersed in a solution with copper ions eluted therein, alkaline electrolytic water obtained by electrolyzing aqueous solution with sodium ascorbate dissolved therein is used as the reducing agent. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006037167(A) 申请公布日期 2006.02.09
申请号 JP20040219129 申请日期 2004.07.27
申请人 SHINKO ELECTRIC IND CO LTD 发明人 TAKENOUCHI TOSHIICHI;YOSHIIKE JUN
分类号 C23C18/40 主分类号 C23C18/40
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