发明名称 PLASMA PROCESSING REACTOR WITH A MAGNETIC ELECTRON-BLOCKING FILTER EXTERNAL OF THE CHAMBER AND UNIFORM FIELD WITHIN THE CHAMBER
摘要 An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet.
申请公布号 US2016225466(A1) 申请公布日期 2016.08.04
申请号 US201514832280 申请日期 2015.08.21
申请人 APPLIED MATERIALS, INC. 发明人 Ramaswamy Kartik;Collins Kenneth S.;Lane Steven;Yang Yang;Wong Lawrence
分类号 G21B1/05 主分类号 G21B1/05
代理机构 代理人
主权项 1. A plasma reactor comprising: an enclosure comprising upper and lower chambers separated at an interface zone; a plasma source coupled to said upper chamber and a process chamber coupled to said lower chamber, said process chamber containing a workpiece support; and a circular magnetic array surrounding said interface zone and located outside of said enclosure, and comprising a circular succession of individual magnets of individual magnetic orientations, each individual magnetic orientation of each respective magnet being in a direction that is a function of an angular location in said circular magnetic array of the respective individual magnet.
地址 Santa Clara CA US