发明名称 |
PLASMA PROCESSING REACTOR WITH A MAGNETIC ELECTRON-BLOCKING FILTER EXTERNAL OF THE CHAMBER AND UNIFORM FIELD WITHIN THE CHAMBER |
摘要 |
An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet. |
申请公布号 |
US2016225466(A1) |
申请公布日期 |
2016.08.04 |
申请号 |
US201514832280 |
申请日期 |
2015.08.21 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
Ramaswamy Kartik;Collins Kenneth S.;Lane Steven;Yang Yang;Wong Lawrence |
分类号 |
G21B1/05 |
主分类号 |
G21B1/05 |
代理机构 |
|
代理人 |
|
主权项 |
1. A plasma reactor comprising:
an enclosure comprising upper and lower chambers separated at an interface zone; a plasma source coupled to said upper chamber and a process chamber coupled to said lower chamber, said process chamber containing a workpiece support; and a circular magnetic array surrounding said interface zone and located outside of said enclosure, and comprising a circular succession of individual magnets of individual magnetic orientations, each individual magnetic orientation of each respective magnet being in a direction that is a function of an angular location in said circular magnetic array of the respective individual magnet. |
地址 |
Santa Clara CA US |