| 摘要 |
<P>PROBLEM TO BE SOLVED: To eliminate flexure of a mask generated by irradiation of the lighting beam while a standard position and attitude are maintained. <P>SOLUTION: On a reticle stage RST for holding a reticle R, setting portions 10a to 10d for supporting four corners of the reticle R is formed. Moreover, attracting ports 27a to 27d for attracting the reticle R through evacuation are respectively formed to the placing portions 10a to 10d. At the time of exposure process, the reticle R is attracted and held with entire portion of the attracting ports 27a to 27d. When the exposing process is interrupted, flexure in the Y direction of the reticle is eliminated by attracting and holding the reticle R only with the attracting ports 27c, 27d, and moreover flexure in the X direction of the reticle is eliminated by attracting and holding the reticle R only with the attracting ports 27b, 27c. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
