发明名称 OPTICAL ELEMENT, MANUFACTURING AND RESTORING METHOD THEREOF AND EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical element capable of obtaining the efficient and quick restoration or the like. <P>SOLUTION: In the case of restoring the optical element 10, the optical element 10 is immersed in hot water whose temperature is a melting point of a background layer 16 or over to melt the background layer 16. Thus, only a multilayer film 14 can simply be exfoliated from a substrate 12. The substrate 12 after the exfoliation processing is recycled via washing, and the upper face 12a is restored to a non-eroded state just after polishing by the exfoliation. The optical element 10 is restored to the original state by forming the background layer 16 and the multilayer film 14 onto the substrate 12 by the method. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041079(A) 申请公布日期 2006.02.09
申请号 JP20040217005 申请日期 2004.07.26
申请人 NIKON CORP 发明人 SHIRAISHI MASAYUKI
分类号 H01L21/027;G02B5/08;G03F7/20;G21K1/06;G21K5/02 主分类号 H01L21/027
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