发明名称 LITHOGRAPHY DEVICE HAVING DOUBLE TELECENTRIC LIGHTING
摘要 <P>PROBLEM TO BE SOLVED: To provide a system and a method for providing a double telecentric system. <P>SOLUTION: There are provided a lighting system 202 for generating a lighting beam of radiation, a reflective system 216, a pattern generator 206 for defining an object side, and a projection system 208. When an reflective system of the pattern generator is in a default state, a reflection part 222 of the reflective system is substantially parallel to the reflection part of the pattern generator, and the reflection part of the pattern generator patterns the lighting beam so that the lighting beam is telecentric in the vicinity of the object side and telecentric in the vicinity of a patterned lighting beam image surface, and a patterned lighting beam 214 is directed to a substrate 210 that defines an image surface through the projection system 208. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041530(A) 申请公布日期 2006.02.09
申请号 JP20050216006 申请日期 2005.07.26
申请人 ASML HOLDING NV 发明人 RYZHIKOV LEV;VLADMIRSKY YULI
分类号 H01L21/027;G02B17/08;G03F7/20 主分类号 H01L21/027
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