发明名称 FOCUSED ION BEAM DEVICE AND METHOD FOR IRRADIATING FOCUSED ION BEAM
摘要 PROBLEM TO BE SOLVED: To provide a focused ion beam device converging an ion beam to a beam-spot position with no magnetic field without isotope separation on a sample even when a magnetic field exists on an optical axis of an ion beam and the magnetic field changes. SOLUTION: A correction magnetic field is generated on the optical axis of the ion beam 3 from a correction magnetic field generation part 10 to offset the deflection of the ion beam by an external magnetic field. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006040809(A) 申请公布日期 2006.02.09
申请号 JP20040222212 申请日期 2004.07.29
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAKEUCHI KOICHIRO;ISHITANI TORU;OSE YOICHI
分类号 H01J37/317;H01J37/04;H01J37/09;H01J37/147;H01J37/16;H01J37/28 主分类号 H01J37/317
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