发明名称 |
FOCUSED ION BEAM DEVICE AND METHOD FOR IRRADIATING FOCUSED ION BEAM |
摘要 |
PROBLEM TO BE SOLVED: To provide a focused ion beam device converging an ion beam to a beam-spot position with no magnetic field without isotope separation on a sample even when a magnetic field exists on an optical axis of an ion beam and the magnetic field changes. SOLUTION: A correction magnetic field is generated on the optical axis of the ion beam 3 from a correction magnetic field generation part 10 to offset the deflection of the ion beam by an external magnetic field. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006040809(A) |
申请公布日期 |
2006.02.09 |
申请号 |
JP20040222212 |
申请日期 |
2004.07.29 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
TAKEUCHI KOICHIRO;ISHITANI TORU;OSE YOICHI |
分类号 |
H01J37/317;H01J37/04;H01J37/09;H01J37/147;H01J37/16;H01J37/28 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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