发明名称 THERMALLY SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS
摘要 <p>A photothermally sensitive composition which is primarily energy sensitive in the near infrared and ultraviolet region of the electromagnetic spectrum is composed of a novolak polymer, a melamine derivative crosslinking compound, an acid-generating compound, a polymeric dissolution inhibitor selected from cellulose acetate butyrate, cellulose acetate propionate and mixtures thereof and an infrared absorbing dye. When applied to the proper support and processed, the composition is useful as an offset lithographic printing plate, color proofing film or image resist.</p>
申请公布号 WO2006014708(A2) 申请公布日期 2006.02.09
申请号 WO2005US25698 申请日期 2005.07.20
申请人 CITIPLATE, INC. 发明人 SETH, PRAKASH;CUSUMANO, CHARLES, S.
分类号 G03C1/494 主分类号 G03C1/494
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