| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination system in which reverse effects of polarized light induced birefringence are reduced or removed. <P>SOLUTION: The lighting system in a projection aligner for microlithography comprises a first polarized manipulator PM1, a second polarized manipulator PM2 and at least one optical element L1, L2 arranged in between them. Although the direction of an electric field vector of a light is made to change, with respect to time between these polarized manipulators, a polarization state is ensure to be fixed outside these polarized manipulators. A high-energy light prevents birefringence from being induced in the optical element, arranged in between the two polarized manipulators. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
