发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device by which the warpage of a photovoltaic cell can be suppressed. <P>SOLUTION: First, a photovoltaic cell 1 provided with an n-type semiconductor layer 3 and a semiconductor substrate 2 is formed. A main surface electrode 4 is formed on the surface of a side for receiving a solar light of the photovoltaic cell 1 by printing method, vapor phase method, or sputtering method or the like. An interconenctor 6 is connected with a main surface electrode 4 to pick up the generated electric power. Next, a rear electrode 5 is formed on the opposite-side surface of the incident side in the photovoltaic cell 1 by the printing method, vapor phase method or plating method. Thus, a semiconductor device provided with a CIC type photovoltaic cell is completed. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006041209(A) 申请公布日期 2006.02.09
申请号 JP20040219575 申请日期 2004.07.28
申请人 SHARP CORP 发明人 TAKAHASHI SUNAO
分类号 H01L31/04 主分类号 H01L31/04
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