PERSONAL CARE COMPOSITIONS CONTAINING CATIONICALLY MODIFIED STARCH AND AN ANIONIC SURFACTANT SYSTEM

摘要

Personal care compositions comprise (a) from 0.01 wt.% to 10 wt.% of a water-soluble cationically modified starch polymer, wherein said water-soluble cationically modified starch polymer has a molecular weight from 1,000 to 200,000 and a charge density from 0.7 meq/g to 7 meq/g; (b) from 5 wt.% to 50 wt.% of an anionic surfactant system, said anionic surfactant system comprising at least one anionic surfactant and having an ethoxylate level and an anion level, (i) wherein sai d ethoxylate level is from 1 to 6, and (ii) wherein said anion level is from about 1 to about 6; and (c) a cosmetically acceptable medium. Personal care compositions as described above further comprise from about 0.01 wt.% to about 10 wt.% of one or more oily conditioning agents. Methods of treating hair or skin comprise applying the personal carePersonal care compositions comprise (a) from 0.01 w t.% to 10 wt.% of a water-soluble cationically modified starch polymer, wherein said water-soluble cationically modified starch polymer has a molecular weight from about 1,000 to about 200,000 and a charge density from about 0.7 meq/g to ab out 7 meq/g; (b) from about 5 wt.% to about 50 wt.% of an anionic surfactant sytem, said anionic surfactant system comprising at least one anionic surfactant and having an ethoxylate level and an anion level, (i) wherein said ethoxylate level is from about 1 to about 6, and (ii) wherein said anion level is from about 1 to about 6; and (c) a cosmetically acceptable medium. Personal care compositions as described above further comprise from about 0.01 wt.% to about 10 wt.% of one or more oily conditioning agents. Methods of treating hair or skin comprise applying the personal care compositions as described above to the hair or skin and rinsing the hair or skin.