| 摘要 |
<p>An exposure apparatus SYS, EX in which by filling at least a portion between a projection optical system PL and a substrate P with a liquid 50 and by projecting an image of a pattern onto the substrate P via said projection optical system PL and said liquid 50, said substrate P is exposed, said exposure apparatus SYS, EX includes: a substrate holding member PH that holds said substrate P and keeps liquid 50 so that said substrate P is immersed in the liquid; and a liquid supply mechanism 12 that supplies, at a vicinity of the projection area AR1 of said projection optical system PL, liquid onto said substrate P from above said substrate P.</p> |
