发明名称 Lithographic Apparatus, Alignment Method and Device Manufacturing Method
摘要 To align between layers having a large Z separation, e.g. in the manufacture of MEMS or MOEMS, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side. <IMAGE>
申请公布号 KR100550031(B1) 申请公布日期 2006.02.08
申请号 KR20030009030 申请日期 2003.02.13
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
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