发明名称 Nitride semiconductor single-crystal substrate and method of its synthesis
摘要 <p>Fracture toughness of AlGaN single-crystal substrate is improved and its absorption coefficient reduced. A nitride semiconductor single-crystal substrate has a composition represented by the formula Al x Ga 1-x N (0 ‰¤ x ‰¤ 1), and is characterized by having a fracture toughness of (1.2-0.7x) MPa€¢m 1/2 or greater and a surface area of 20 cm 2 , or, if the substrate has a composition represented by the formula Al x Ga 1-x N (0.5 ‰¤ x ‰¤ 1), by having an absorption coefficient of 50 cm -1 or less in a 350 to 780 nm total wavelength range.</p>
申请公布号 EP1624095(A2) 申请公布日期 2006.02.08
申请号 EP20050016895 申请日期 2005.08.03
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 FUJIWARA, SHINSUKE;NAKAHATA, SEIJI
分类号 C30B29/40;C30B25/02 主分类号 C30B29/40
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