| 摘要 |
A tantalum spattering target manufactured by working a molten and cast tantalum ingot or billet by forging, annealing, and rolling, characterized in that the structures of the tantalum spattering target comprises non-recrystallized structures. The tantalum spattering target having a high film-forming speed and excellent uniformity of film, producing less micro arcings and particles, and having excellent film forming properties and the method capable of stably manufacturing the target can be provided by improving and devising plastic working steps such as forging and rolling and a heat treatment step.
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