| 摘要 |
The present invention addresses the problem of providing: a pattern formation method which is capable of improving the degree of freedom in the setting of the arrangement interval of fine wires including a functional material, without destabilizing the formation of the fine wires; a transparent conductive film-equipped substrate; a device; and an electronic apparatus. In this pattern formation method, a plurality of droplets including a functional material are discharged onto a substrate 1 from a droplet discharge device 4, while moving the droplet discharge device 4 relatively to the substrate 1, the plurality of droplets are made to coalesce on the substrate 1 to form a linear liquid, and when the formed linear liquid is dried, the functional material accumulates at the edges of the linear liquid, and a pattern including the functional material is formed. When forming the linear liquid, a plurality of droplet sets imparted from a plurality of nozzles 41 to pixel sets arranged parallel to a nozzle row 40 of the droplet discharge device 4, are imparted in the direction intersecting the nozzle row 40, and the plurality of droplet sets are made to coalesce to form the linear liquid which extends in the direction intersecting the nozzle row 40. |
