发明名称 COATING PROCESSING METHOD, COMPUTER STORAGE MEDIUM, AND COATING PROCESSING DEVICE
摘要 In the present invention, a coating processing method in which a coating liquid is coated onto a substrate involves the following: a solvent liquid-film forming step in which a first liquid film is formed by a solvent on a central portion of the substrate, and a ring-shaped second liquid film having a greater thickness than the first liquid film is formed by the solvent on the outer peripheral portion of the substrate; a coating liquid supply step in which the coating liquid is supplied to the central portion of the substrate while the substrate is caused to rotate at a first rotational speed; and a coating liquid dispersion step in which the substrate is caused to rotate at a second rotational speed, that is faster than the first rotational speed, while the coating liquid is supplied, thereby dispersing the coating liquid onto the substrate.
申请公布号 WO2016140012(A1) 申请公布日期 2016.09.09
申请号 WO2016JP53335 申请日期 2016.02.04
申请人 TOKYO ELECTRON LIMITED 发明人 HASHIMOTO, Takafumi;HATAKEYAMA, Shinichi;SHIBATA, Naoki;YOSHIHARA, Kousuke
分类号 B05D1/40;B05C11/08 主分类号 B05D1/40
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