发明名称 |
COATING PROCESSING METHOD, COMPUTER STORAGE MEDIUM, AND COATING PROCESSING DEVICE |
摘要 |
In the present invention, a coating processing method in which a coating liquid is coated onto a substrate involves the following: a solvent liquid-film forming step in which a first liquid film is formed by a solvent on a central portion of the substrate, and a ring-shaped second liquid film having a greater thickness than the first liquid film is formed by the solvent on the outer peripheral portion of the substrate; a coating liquid supply step in which the coating liquid is supplied to the central portion of the substrate while the substrate is caused to rotate at a first rotational speed; and a coating liquid dispersion step in which the substrate is caused to rotate at a second rotational speed, that is faster than the first rotational speed, while the coating liquid is supplied, thereby dispersing the coating liquid onto the substrate. |
申请公布号 |
WO2016140012(A1) |
申请公布日期 |
2016.09.09 |
申请号 |
WO2016JP53335 |
申请日期 |
2016.02.04 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HASHIMOTO, Takafumi;HATAKEYAMA, Shinichi;SHIBATA, Naoki;YOSHIHARA, Kousuke |
分类号 |
B05D1/40;B05C11/08 |
主分类号 |
B05D1/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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