发明名称 |
Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types |
摘要 |
A method and system of making a mask with a transparent substrate thereon is provided. A first resolution enhancement structure is formed on the first portion of the transparent substrate. A second resolution enhancement structure is formed on a second portion of the transparent substrate, with the second resolution enhancement structure different from the first resolution enhancement structure.
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申请公布号 |
US6994939(B1) |
申请公布日期 |
2006.02.07 |
申请号 |
US20020283685 |
申请日期 |
2002.10.29 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GHANDEHARI KOUROS;YANG JEAN Y.;SPENCE CHRISTOPHER A. |
分类号 |
G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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