发明名称 |
Film evaluating method, temperature measuring method, and semiconductor device manufacturing method |
摘要 |
Reference infrared-absorption spectrum patterns are prepared in advance as a database. The infrared-absorption spectrum pattern of a film targeted for measurement is measured using FT-IR spectroscopy. Subsequently, multivariate analysis is performed using PLS regression, based on the reference infrared-absorption spectrum patterns and the infrared-absorption spectrum pattern of the target film. The film-growing temperature and other factors are then computed in accordance with the analysis results.
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申请公布号 |
US6994750(B2) |
申请公布日期 |
2006.02.07 |
申请号 |
US20030415435 |
申请日期 |
2003.04.29 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
TATSUNARI TOSHITAKA |
分类号 |
C30B25/14;G01N21/35;H01L21/66 |
主分类号 |
C30B25/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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