发明名称 |
Method and system for thick-film deposition of ceramic materials |
摘要 |
A method of depositing a solid film on a substrate in which a stream comprising particles suspended in a transport gas is moved through a heating zone. The particles are combined with the transport gas from a powder feeder operatively coupled to a gas flow tube. The particle stream is directed toward the heating zone by ejecting the powder stream from a nozzle connected to a distal end of the gas flow tube. A radiation source is directed at the suspended particles as they move through the heating zone so that the particles heated to a molten state. The droplets are undercooled in a cooling zone before impact with the substrate.
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申请公布号 |
US6994894(B2) |
申请公布日期 |
2006.02.07 |
申请号 |
US20010958705 |
申请日期 |
2001.10.09 |
申请人 |
VANDERBILT UNIVERSITY |
发明人 |
HOFMEISTER WILLIAM |
分类号 |
C23C14/30;C04B35/45;C23C4/12;C23C8/00;C23C14/28;C23C24/04 |
主分类号 |
C23C14/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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