发明名称 |
Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure |
摘要 |
A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
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申请公布号 |
US6995831(B2) |
申请公布日期 |
2006.02.07 |
申请号 |
US20050068895 |
申请日期 |
2005.03.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LEVASIER LEON MARTIN;DEN BOEF ARIE JEFFREY;DIRNSTORFER INGO;JEUNINK ANDRE BERNARDUS;KRUIJSWIJK STEFAN GEERTE;PELLEMANS HENRICUS PETRUS MARIA;SETIJA IRWAN DANI;TOLSMA HOITE PIETER THEODOOR |
分类号 |
G01B11/00;G03B27/42;G03F1/00;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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