发明名称 Thin film transistor and fabrication method for same
摘要 A thin film transistor and a method for fabricating the same. The thin film transistor comprises a substrate and a patterned semiconductive layer formed on the substrate, wherein the semiconductive layer comprises a channel region and doped regions adjacent to the channel region. A gate insulating layer is formed on the above structure. A gate electrode is located on the gate insulating layer above the channel region. Source and drain electrodes are located on the gate insulating layer adjacent to the semiconductive layer. A dielectric layer having contact holes is formed on the above structure and a patterned conductive layer is formed on predetermined parts of the dielectric layer electrically connecting the doped regions to the source and drain electrode through the contact holes.
申请公布号 US6995050(B2) 申请公布日期 2006.02.07
申请号 US20040975470 申请日期 2004.10.29
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN CHEN-MING;WU YUNG-FU
分类号 G02F1/1368;H01L21/00;H01L21/28;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/417;H01L29/423;H01L29/49;H01L29/786;H01L51/50 主分类号 G02F1/1368
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