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发明名称
PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION CONTAINING IT
摘要
申请公布号
KR20060011423(A)
申请公布日期
2006.02.03
申请号
KR20040060267
申请日期
2004.07.30
申请人
HYNIX SEMICONDUCTOR INC.
发明人
SON, MIN SEOK
分类号
G03F7/04;G03C1/492;G03F7/004;G03F7/039;G03F7/075
主分类号
G03F7/04
代理机构
代理人
主权项
地址
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