| 摘要 |
PROBLEM TO BE SOLVED: To recover acid at high yield together with separation of metal from metal-containing waste liquid acid generated from a metal etching process, etc., in a semiconductor producing work. SOLUTION: A regenerating apparatus for metal-containing waste liquid acid is composed of; (A) a diffusion-dialysis chamber 1 partitioned with a diffusion-dialysis layer; (B) a feeding means 3 for feeding the metal-containing waste liquid acid into the diffusion-dialysis chamber at the one side separated with the diffusion-dialysis layer; (C) a water supplemental means 5 for supplementing the water into the diffusion-dialysis chamber at the other side separated with the diffusion-dialysis layer; (D) a feeding means 7 for feeding the metal-containing waste liquid acid treated in the diffusion-dialysis chamber into a distillation tower for dialyzed residual liquid concentration; (E) a means 11 for recovering regenerated acid-containing solution from the bottom part at the supplemental side of the water in the diffusion-dialysis chamber; (F) the distillation tower 8 for dialyzed residual liquid concentration; (G) a feeding means 9 for feeding distilled water obtained from the distillation tower for dialyzed residual liquid concentration into the water supplemental means; and (H) a means 10 for recovering the metal-containing waste liquid acid containing the concentrated metal from the bottom of the distillation tower for dialyzed residual liquid concentration. COPYRIGHT: (C)2006,JPO&NCIPI
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