EPITAXIAL REACTOR WITH SUSCEPTOR CONTROLLED POSITIONING
摘要
The invention relates to a system for controlling the positioning of a susceptor (2) rotating in the reaction chamber (3) of an epitaxial reactor. The control is carried out on the basis of the different path of a laser beam transmitted by a source (15) when it is reflected by a pin (8) arranged on the susceptor (2).
申请公布号
WO2006011169(A1)
申请公布日期
2006.02.02
申请号
WO2004IT00430
申请日期
2004.07.30
申请人
LPE SPA;PRETI, FRANCO;OGLIARI, VINCENZO;TARENZI, GIUSEPPE