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发明名称
EQUIPMENT FOR CLEANING PHOTO RESIST NOZZLE IN SEMICONDUCTOR COATING DEVICE
摘要
申请公布号
KR20060010316(A)
申请公布日期
2006.02.02
申请号
KR20040058973
申请日期
2004.07.28
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
LEE, JONG HAW
分类号
H01L21/02
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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