| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method capable of manufacturing a mask blank without any minute projecting defect on a thin film surface formed on a substrate. <P>SOLUTION: The method includes: a film forming step of forming a thin film 12 to be processed into a transfer pattern on a substrate 11; a surface information acquiring step of acquiring surface information including the surface figure information and positional information of the thin film 12 after the film forming step; a correcting step of selecting projections 2, 3 from the surface figure information obtained by the surface information acquiring step and then correcting to decrease the height of the projections 2, 3; and then a cleaning step of cleaning the surface of the thin film 12. The surface figure information includes information about the size of projections 2, 3. The correcting step is carried out by bringing a needle-like member 4 into contact with the projections 2, 3 to add mechanical force to decrease the height of the projections 2, 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
