发明名称 PLANT PROCESSING APPARATUS AND PLANT PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plant processing method capable of easily and surely applying a coating layer on a plant. SOLUTION: A supporting shelf 120 is placed in a case 111, a heating part 130 is placed in the case 111, a wax tank 150 is placed on the heating part 130, and a wax 2 is put into the wax tank 150. A flower 3 is placed on the supporting shelf 120 and the wax tank 150 is heated with the heating part 130 to evaporate the wax 2, fill the case 111 with the vapor of the wax 2 and coat the flower 3 with the wax 2. The evaporated wax 2 is discharged through a ventilation port 115 bored on the wall of the case 111 at a definite rate together with the waste heat generated by the heating part 130. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006028136(A) 申请公布日期 2006.02.02
申请号 JP20040212832 申请日期 2004.07.21
申请人 CORONET:KK 发明人 KUMAZAKI KENICHI
分类号 A01N3/00 主分类号 A01N3/00
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